Negative resist composition and patterning process
First Claim
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1. A negative resist composition comprising at least:
- (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid;
(B) an acid generator; and
(C) a basic component,wherein the base polymer at least contains a polymer including repeating units represented by the following;
general formula (1), general formula (2), and general formula (3), and having a weight average molecular weight of 1,000 to 10,000,
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Abstract
There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same.
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14 Claims
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1. A negative resist composition comprising at least:
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(A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following;
general formula (1), general formula (2), and general formula (3), and having a weight average molecular weight of 1,000 to 10,000, - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification