Negative resist composition and patterning process

  • US 8,828,645 B2
  • Filed: 10/25/2013
  • Issued: 09/09/2014
  • Est. Priority Date: 12/10/2009
  • Status: Active Grant
First Claim
Patent Images

1. A negative resist composition comprising at least:

  • (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid;

    (B) an acid generator; and

    (C) a basic component,wherein the base polymer at least contains a polymer including repeating units represented by the following;

    general formula (1), general formula (2), and general formula (3), and having a weight average molecular weight of 1,000 to 10,000,

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