Chemically amplified negative resist composition and patterning process
First Claim
1. A chemically amplified negative resist composition comprising (A) a base polymer which is soluble in an aqueous alkaline developer, (B) an acid generator capable of generating an acid catalyst, and (C) a nitrogen-containing compound as a basic component, said base polymer as component (A) turning alkali insoluble under the action of the acid catalyst in the presence or absence of a crosslinker, whereina polymer comprising recurring units of a fluorinated carboxylic acid onium salt having the general formula (1) and having a weight average molecular weight of 1,000 to 50,000 is included as at least a portion of said base polymer,
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Abstract
A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble base polymer, (B) an acid generator, and (C) a nitrogen-containing compound, the base polymer (A) turning alkali insoluble under the catalysis of acid. A polymer having a fluorinated carboxylic acid onium salt on a side chain is included as the base polymer. Processing the negative resist composition by a lithography process may form a resist pattern with advantages including uniform low diffusion of acid, improved LER, and reduced substrate poisoning.
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10 Claims
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1. A chemically amplified negative resist composition comprising (A) a base polymer which is soluble in an aqueous alkaline developer, (B) an acid generator capable of generating an acid catalyst, and (C) a nitrogen-containing compound as a basic component, said base polymer as component (A) turning alkali insoluble under the action of the acid catalyst in the presence or absence of a crosslinker, wherein
a polymer comprising recurring units of a fluorinated carboxylic acid onium salt having the general formula (1) and having a weight average molecular weight of 1,000 to 50,000 is included as at least a portion of said base polymer,
Specification