Chemically amplified negative resist composition and patterning process

  • US 8,859,181 B2
  • Filed: 02/24/2011
  • Issued: 10/14/2014
  • Est. Priority Date: 02/26/2010
  • Status: Active Grant
First Claim
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1. A chemically amplified negative resist composition comprising (A) a base polymer which is soluble in an aqueous alkaline developer, (B) an acid generator capable of generating an acid catalyst, and (C) a nitrogen-containing compound as a basic component, said base polymer as component (A) turning alkali insoluble under the action of the acid catalyst in the presence or absence of a crosslinker, whereina polymer comprising recurring units of a fluorinated carboxylic acid onium salt having the general formula (1) and having a weight average molecular weight of 1,000 to 50,000 is included as at least a portion of said base polymer,

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