Thin film deposition apparatus and method of depositing thin film
First Claim
1. A method of manufacturing a thin film on a substrate comprising:
- passing vaporized deposition material through first slits of a first nozzle of a thin film deposition assembly, the first slits being arranged in a first direction;
passing the vaporized deposition material received from the first slits through second slits of a second nozzle of the thin film deposition assembly;
using an adjusting member comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited by moving the second nozzle relative to a base frame, a tray accommodating the second nozzle being arranged on the base frame; and
depositing the deposition material from the second nozzle onto the deposition target area.
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0 Petitions
Accused Products
Abstract
A method of manufacturing a thin film on a substrate including: disposing the substrate to be separated from a thin film deposition apparatus by a preset distance; passing vaporized deposition material through first slits of a first nozzle, the first slits arranged in a first direction; passing the vaporized deposition material received from the first slits through second slits of a second nozzle of the thin film deposition apparatus; using an adjusting member including an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited; and depositing the deposition material from the second nozzle onto the deposition target area while the thin film deposition apparatus or the substrate is moved relative to the other, the second nozzle defining a pattern of deposition material on the substrate, is disclosed.
160 Citations
73 Claims
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1. A method of manufacturing a thin film on a substrate comprising:
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passing vaporized deposition material through first slits of a first nozzle of a thin film deposition assembly, the first slits being arranged in a first direction; passing the vaporized deposition material received from the first slits through second slits of a second nozzle of the thin film deposition assembly; using an adjusting member comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited by moving the second nozzle relative to a base frame, a tray accommodating the second nozzle being arranged on the base frame; and depositing the deposition material from the second nozzle onto the deposition target area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70)
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71. A method of manufacturing a thin film on a substrate comprising:
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passing vaporized deposition material through first slits of a first nozzle, the first slits being arranged in a first direction; passing the vaporized deposition material received from the first slits through second slits of a second nozzle; using an adjusting member comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited; and depositing the deposition material from the second nozzle onto the deposition target area, wherein the method utilizes a thin film deposition apparatus comprising; a deposition source; the first nozzle disposed at a side of the deposition source and including a plurality of the first slits arranged in the first direction; the second nozzle disposed opposite to the first nozzle and including a plurality of the second slits arranged in the first direction; a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; a base frame; a tray that is arranged on the base frame and accommodates the second nozzle therein; and the adjusting member comprising an interval control member that adjusts an interval between the second nozzle and the substrate, the interval control member comprising; a sensor that senses a position of the second nozzle above the substrate; and the actuator that provides a driving force to move the second nozzle relative to the substrate to adjust the interval according to the sensed position, and wherein the actuator adjusts the interval between the second nozzle and the substrate by moving the second nozzle relative to the tray.
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72. A method of manufacturing a thin film on a substrate comprising:
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passing vaporized deposition material through first slits of a first nozzle, the first slits being arranged in a first direction; passing the vaporized deposition material received from the first slits through second slits of a second nozzle; using an adjusting member comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited; and depositing the deposition material from the second nozzle onto the deposition target area, wherein the method utilizes a thin film deposition apparatus comprising; a deposition source; the first nozzle disposed at a side of the deposition source and including a plurality of the first slits arranged in the first direction; the second nozzle disposed opposite to the first nozzle and including a plurality of the second slits arranged in the first direction; a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; a base frame; a tray that is arranged on the base frame and accommodates the second nozzle therein; and the adjusting member comprising an alignment control member that adjusts an alignment between the second nozzle and the substrate, the alignment control member comprising; a sensor that senses a position of the second nozzle above the substrate; and the actuator that provides a driving force to move the second nozzle relative to the substrate to adjust the alignment according to the sensed position, and wherein the actuator adjusts the alignment between the second nozzle and the substrate by moving the second nozzle relative to the base frame.
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73. A method of manufacturing a thin film on a substrate comprising:
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disposing the substrate at a preset distance from a thin film deposition assembly; passing vaporized deposition material through first slits of a first nozzle of the thin film deposition assembly, the first slits being arranged in a first direction; passing the vaporized deposition material received from the first slits through second slits of a second nozzle of the thin film deposition assembly; using an adjusting member comprising an actuator set to adjust an orientation of the second nozzle relative to a deposition target area on the substrate on which the deposition material from the second nozzle is to be deposited; and depositing the deposition material from the second nozzle onto the deposition target area while the thin film deposition assembly or the substrate is moved relative to the other of the thin film deposition assembly and the substrate, the second nozzle defining a pattern of deposition material on the substrate, wherein the actuator set adjusts an orientation of the second nozzle by moving the second nozzle relative to a base frame and a tray accommodating the second nozzle, the tray being arranged on the base frame.
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Specification