Method for manufacturing a compound film
First Claim
1. A method of manufacturing a compound film layer, comprising:
- forming the compound film layer composed of at least a first material and a second material on a first surface of a substrate as the substrate is transferred in a first direction relative to a deposition source block, wherein the deposition source block comprises a first deposition source adapted to deliver a flux of the first material to the first surface and a second deposition source adapted to deliver a flux of the second material to the first surface;
measuring a property of the compound film layer using a measurement device that is positioned over a second surface of the substrate, wherein the measurement device comprises an x-ray detector and an electron source or an x-ray source, and wherein the second surface is opposed to the first surface of the substrate, the substrate is disposed between the measurement device and the deposition source block and the measured property of the compound film layer is selected from a group consisting of thickness and composition; and
adjusting the flux of the first material delivered to the first surface as the substrate is transferred in the first direction, based on a comparison of the measured property and a predefined value.
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Accused Products
Abstract
A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.
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Citations
19 Claims
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1. A method of manufacturing a compound film layer, comprising:
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forming the compound film layer composed of at least a first material and a second material on a first surface of a substrate as the substrate is transferred in a first direction relative to a deposition source block, wherein the deposition source block comprises a first deposition source adapted to deliver a flux of the first material to the first surface and a second deposition source adapted to deliver a flux of the second material to the first surface; measuring a property of the compound film layer using a measurement device that is positioned over a second surface of the substrate, wherein the measurement device comprises an x-ray detector and an electron source or an x-ray source, and wherein the second surface is opposed to the first surface of the substrate, the substrate is disposed between the measurement device and the deposition source block and the measured property of the compound film layer is selected from a group consisting of thickness and composition; and adjusting the flux of the first material delivered to the first surface as the substrate is transferred in the first direction, based on a comparison of the measured property and a predefined value. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of manufacturing a compound film layer, comprising:
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forming the compound film layer composed of at least a first material and a second material on a first surface of a flexible substrate as the flexible substrate is transferred in a first direction relative to a first deposition source, a second deposition source and a third deposition source, wherein forming the compound film layer on first surface of the flexible substrate further comprises; heating an amount of the first material disposed in the first deposition source to form a first flux that is received by the first surface; heating an amount of the second material disposed in the second deposition source to form a second flux that is received by the first surface; and heating an amount of the first material disposed in the third deposition source to form a third flux that is received by the first surface, wherein the first material and the second material have a different composition, and the first, second and third deposition sources are disposed a distance apart along the first direction; measuring a property of the compound film layer using a fluorescence spectrometer that is positioned over a second surface of the flexible substrate, wherein the second surface is opposed to the first surface of the substrate, the substrate is disposed between the measurement device and the first, second and third deposition sources, and the property of the compound film layer is selected from a group of properties consisting of thickness and composition; and adjusting the first flux, the second flux or the third flux based on a comparison of the measured property and a predefined value. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification