MEMS structure for an angular rate sensor

• US 9,080,870 B2
• Filed: 04/15/2011
• Issued: 07/14/2015
• Est. Priority Date: 04/16/2010
• Status: Active Grant

• Current Assignee: SensoNor ASA (Infineon Technologies AG)
• Original Assignee: SensoNor ASA (Infineon Technologies AG)
• Inventors: Kittilsland, Gjermund, Lapadatu, Daniel, Jacobsen, Sissel
• Primary Examiner(s): CHAPMAN JR, JOHN E
• Application Number:
  US13/639,376
• Publication Number:
  US 20130019680A1
• Time in Patent Office: 1,551 Days
• Field of Search: 735/041.2
• US Class Current: 1/1
• CPC Class Codes: G01C 19/5712 the devices involving a micromechanical structure

Abstract

A micro-electromechanical system (MEMS) structure for an angular rate sensor includes seismic masses arranged to have a first degree of rotational freedom about an axis that is substantially perpendicular to the plane of a silicon substrate, and a second degree of rotational freedom about an axis substantially coincident with the longitudinal axis of driving beams to which the seismic masses are attached. A sensing system is arranged such that, when the structure is subjected to an angular velocity around a third axis that is substantially in the plane of the silicon substrate and perpendicular to the longitudinal axis of the beams, a Coriolis force arises which causes the secondary oscillation of the seismic masses.

Claims

1. A micro-electromechanical system (MEMS) structure for an angular rate sensor, the structure being positioned between first and second silicon-insulator composite wafers formed of a plurality of structured silicon parts, electrically isolated from each other by an insulator material, the structure comprising:

a mono-crystalline silicon substrate structured to form a sensing system and a frame, the sensing system being completely de-coupled from and surrounded by the frame, which is positioned between engaging surfaces of the first and second composite wafers such that the sensing system is hermetically sealed within a cavity defined by the first and second composite wafers and the frame, the sensing system including;

two seismic masses having front and back surfaces;

two driving beams, each having a first end attached to a seismic mass and a second end attached to the first and second composite wafers by means of fixed pedestals provided on the silicon substrate; and

a bending spring arranged to directly connect between, and synchronise a primary motion of, the two seismic masses,

each of the seismic masses being arranged to have a first degree of rotational freedom about an axis that is substantially perpendicular to the plane of the silicon substrate, and

the seismic masses and driving beams being arranged to have a second degree of rotational freedom about an axis substantially coincident with the longitudinal axis of the driving beams;

means for generating and detecting the primary motion consisting of a primary oscillation of the two seismic masses, in opposing phases, in the first degree of rotational freedom;

means for detecting a secondary motion consisting of a secondary oscillation of the two seismic masses, in opposing phases, in the second degree of rotational freedom,

the means of generating and detecting the primary motion and the means of detecting a secondary motion being provided on both the front and back surfaces of each of the first and second seismic masses,

wherein the sensing system is arranged such that, when the structure is subjected to an angular velocity around a third axis that is substantially in the plane of the silicon substrate and perpendicular to the longitudinal axis of the beams, a Coriolis force arises which causes the secondary oscillation of the seismic masses,

wherein the engaging surface of the first composite wafer mirrors or matches the engaging surface of the second composite wafer,

wherein the seismic masses, the pedestals, the means for generating and detecting the primary motion, and the means for detecting the secondary motion are symmetrically disposed about perpendicular axes,

wherein the means for generating and detecting the primary motion involves the use, in a capacitive manner, of at least two fixed electrodes provided above and below each seismic mass,

wherein the means for detecting the secondary motion involves the use, in a capacitive manner, of at least two fixed electrodes provided above and below each seismic mass; and

means for adjusting the frequency of the oscillations, the adjustment being achieved in a capacitive manner using at least two fixed electrodes located above and below each seismic masses.

2. The structure of claim 1, further comprising means for compensating parasitic quadrature oscillations, the compensation being achieved in a capacitive manner using at least four fixed electrodes located above and below each seismic mass.

3. The structure of claim 2, further comprising recesses on the front and back surfaces of each seismic masses to provide capacitance gaps.

4. The structure of claim 3, wherein the beams exhibit a cross-sectional geometrical asymmetry such that the primary motion may be initiated by an excitation force that is substantially perpendicular to the front and back surfaces of the seismic masses.

5. The structure of claim 3, wherein the beams exhibit full cross-sectional symmetry such that the primary motion may be initiated by an excitation force that is substantially parallel to the front and back surfaces of the seismic masses.

6. The structure of claim 5, wherein the seismic masses and beams have substantially the same thickness and a symmetry axis of the seismic masses substantially coincides with the third axis.

7. The structure of claim 6, further comprising stress-release means arranged on at least two opposing sides of the silicon frame.

8. The structure of claim 6, further comprising stress-release means interposed between each end of the bending spring and the adjacent seismic mass, respectively.

9. The structure of claim 6, further comprising stress-release means interposed between each seismic mass and the adjacent driving beam, respectively.

10. The structure of claim 9, wherein the driving beams and the bending spring have substantially identical cross-sections.

11. The structure of claim 10, wherein the seismic masses have substantially identical geometry.

12. The structure of claim 11, further comprising a getter material that helps preserve a high vacuum inside the hermetically sealed cavity.

13. The structure of claim 12, further comprising silicon stoppers provided on the seismic masses.

14. A micro-electromechanical system (MEMS) structure for an angular rate sensor, the structure being positioned between first and second silicon-insulator composite wafers formed of a plurality of structured silicon parts, electrically isolated from each other by an insulator material, the structure comprising:

a mono-crystalline silicon substrate structured to form a sensing system and a frame, the sensing system being completely de-coupled from and surrounded by the frame, which is positioned between engaging surfaces of the first and second composite wafers such that the sensing system is hermetically sealed within a cavity defined by the first and second composite wafers and the frame, the sensing system including;

two seismic masses having front and back surfaces;

two driving beams, each having a first end attached to a seismic mass and a second end attached to the first and second composite wafers by means of fixed pedestals provided on the silicon substrate; and

a bending spring arranged to directly connect between, and synchronise a primary motion of, the two seismic masses,

each of the seismic masses being arranged to have a first degree of rotational freedom about an axis that is substantially perpendicular to the plane of the silicon substrate, and

the seismic masses and driving beams being arranged to have a second degree of rotational freedom about an axis substantially coincident with the longitudinal axis of the driving beams;

at least two fixed electrodes provided above and below each seismic mass on both the front and back surfaces of each of the first and second seismic masses for generating and detecting the primary motion consisting of a primary oscillation of the two seismic masses, in opposing phases, in the first degree of rotational freedom;

at least another two fixed electrodes provided above and below each seismic mass on both the front and back surfaces of each of the first and second seismic masses for detecting a secondary motion consisting of a secondary oscillation of the two seismic masses, in opposing phases, in the second degree of rotational freedom; and

a further at least two electrodes located above and below each seismic mass for adjusting the frequency of the oscillations,

wherein the sensing system is arranged such that, when the structure is subjected to an angular velocity around a third axis that is substantially in the plane of the silicon substrate and perpendicular to the longitudinal axis of the beams, a Coriolis force arises which causes the secondary oscillation of the seismic masses,

wherein the beams exhibit a cross-sectional geometrical asymmetry such that the primary motion may be initiated by an excitation force that is substantially perpendicular to the front and back surfaces of the seismic masses.