Semiconductor device and method of manufacturing the same
First Claim
1. A semiconductor device, comprising:
- first control gates alternately stacked with first interlayer insulating layers;
at least one selection gates alternately stacked with at least one second interlayer insulating layer on the control gates and the first interlayer insulating layers;
a first channel layer passing through the control gates and the first interlayer insulating layers and including polysilicon; and
a second channel layer formed on the first channel layer and passing through the at least one selection gate and the at least one second interlayer insulating layer, wherein the first channel layer and the second channel layer are located in different levels, an upper surface of the first channel layer contacts a lower surface of the second channel layer, and the second channel layer includes silicon germanium.
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Accused Products
Abstract
A semiconductor device includes first conductive layers and first interlayer insulating layers stacked alternately with each other, at least one second conductive layer and at least one second interlayer insulating layer formed on the first conductive layers and the first interlayer insulating layers and stacked alternately with each other, a first semiconductor layer passing through the first conductive layers and the first interlayer insulating layers and including polysilicon, and a second semiconductor layer coupled to the first semiconductor layer and passing through the at least one second conductive layer the at least one second interlayer insulating layer, wherein the second semiconductor layer includes silicon germanium.
12 Citations
20 Claims
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1. A semiconductor device, comprising:
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first control gates alternately stacked with first interlayer insulating layers; at least one selection gates alternately stacked with at least one second interlayer insulating layer on the control gates and the first interlayer insulating layers; a first channel layer passing through the control gates and the first interlayer insulating layers and including polysilicon; and a second channel layer formed on the first channel layer and passing through the at least one selection gate and the at least one second interlayer insulating layer, wherein the first channel layer and the second channel layer are located in different levels, an upper surface of the first channel layer contacts a lower surface of the second channel layer, and the second channel layer includes silicon germanium. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device, comprising:
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memory cells including a first channel layer having a polysilicon layer; and selection transistors, each including a second channel layer connected to the first channel layer, wherein the first channel layer and the second channel layer are located in different levels, an upper surface of the first channel layer contacts a lower surface of the second channel layer, and the second channel layer includes a silicon germanium layer. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A semiconductor device, comprising:
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control gates alternately stacked with first interlayer insulating layers; at least one selection gate alternately stacked with at least one second interlayer insulating layer on the control gates and the first interlayer insulating layers; a first channel layer passing through the control gates and the first interlayer insulating layers and including polysilicon; a second channel layer formed on the first channel layer and passing through the at least one selection gates and the at least one second interlayer insulating layer, wherein the first channel layer and the second channel layer are located in different levels, an upper surface of the first channel layer contacts a lower surface of the second channel layer, and the second channel layer includes silicon germanium and has a tubular structure; a first insulating layer formed in an opening defined in a lower portion of the second channel layer; and a junction formed in an opening defined in an upper portion of the second channel layer. - View Dependent Claims (19, 20)
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Specification