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Array substrate, method for manufacturing the same and display apparatus

  • US 9,146,431 B2
  • Filed: 11/12/2012
  • Issued: 09/29/2015
  • Est. Priority Date: 03/31/2012
  • Status: Active Grant
First Claim
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1. A method for manufacturing an array substrate, comprising procedures of:

  • forming a common electrode line (5), a common electrode (2) and a thin film transistor on a substrate (1), wherein the thin film transistor comprises a gate electrode (4), a source electrode (8a) and a drain electrode (8b); and

    forming an insulating layer (3) between the gate electrode (4) and the common electrode (2) to isolate the gate electrode (4) from the common electrode (2), wherein the method comprises the following steps;

    step A, forming the common electrode (2), the insulating layer (3), the gate electrode (4) and the common electrode line (5) on the substrate (1);

    step B, forming a gate electrode protection layer (6), an active layer (7), the source electrode (8a) and the drain electrode (8b) on a resultant structure of the step A;

    step C, forming a passivation layer (9) on a resultant structure of the step B, wherein a second through hole (12) is formed in the passivation layer (9); and

    step D, forming a pixel electrode (10) on a resultant structure of the step C, wherein the pixel electrode (10) is connected with the drain electrode (8b) through the second through hole (12).

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