Arc source and magnet configuration

• US 9,165,749 B2
• Filed: 05/14/2007
• Issued: 10/20/2015
• Est. Priority Date: 05/16/2006
• Status: Active Grant

• Current Assignee: Oerlikon Surface Solutions Ag, PfAffikon (OC Oerlikon Corporation AG)
• Original Assignee: Oerlikon Trading AG (OC Oerlikon Corporation AG)
• Inventors: Krassnitzer, Siegfried, Gwehenberger, Juergen, Hagmann, Jrg
• Primary Examiner(s): BAND, MICHAEL A
• Application Number:
  US11/747,999
• Publication Number:
  US 20080110749A1
• Time in Patent Office: 3,081 Days
• Field of Search: 204/192.12, 204/192.38, 204/298.2, 204/298.41, 427/540, 427/580
• US Class Current: 1/1
• CPC Class Codes: C23C 14/325 Electric arc evaporation
• CPC Class Codes: C23C 14/564 Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
• CPC Class Codes: H01J 37/32055 Arc discharge
• CPC Class Codes: H01J 37/32614 Consumable cathodes for arc discharge
• CPC Class Codes: H01J 37/3266 Magnetic control means
• CPC Class Codes: H01J 37/345 Magnet arrangements in particular for cathodic sputtering apparatus material of magnets or magnets in general H01F1/00, H01F7/00
• CPC Class Codes: H01J 37/3452 Magnet distribution
• CPC Class Codes: H01J 37/3458 Electromagnets in particular for cathodic sputtering apparatus electromagnets in general H01F7/06

Abstract

The invention relates to an arc source with a target (1) having a target front face (2) for the vacuum vaporization of the target material, a target backside with a cooling plate (4), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration (8, 9) with an inner magnet system (8) and/or an outer magnet system (9) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems (8) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face (2).

Claims

1. An arc source with a target (1), comprising:

a target front face (2) for vacuum-arc-evaporating target material;

a target backside;

a central target region (Z);

a target margin region (A) defining a periphery of the target (1);

a magnet system consisting of an inner magnet system (8) in a region of said central target region (Z) and an outer magnet system (9) in the target margin region (A), for providing a magnetic field in a region of said target front face (2), the outer magnet system (9) being outside the periphery of the target (1);

an additional magnet configuration comprising a coil looped around a center of said target (1), wherein an outer periphery of the outer magnet system (9) shares an outer periphery of the coil;

wherein said inner magnet system (8) is separate from said outer magnet system (9) and wherein said inner magnet system (8) is arranged at or behind said target backside and consists of dipoles (D₈) provided by magnets;

wherein said outer magnet system (9) is arranged at or behind said target backside;

wherein said coil is arranged at or behind said target backside;

wherein each of said dipoles (D₈), which are provided by said magnets of said inner magnet system (8), are orientated at least substantially parallel to said target front face (2);

wherein at said target front face (2) components of said magnetic field parallel (B_r) to said target front face (2) are larger than components of said magnetic field perpendicular (B_z) to said target front face (2) in a region of a surface area (R′

) of at least 80% of said target front face (2);

wherein said dipoles (D₈) and said magnets are provided by said inner magnet system (8),

further comprising a cover in said central target region (Z) electrically insulated from said target (1) and along said target front face (2), and

wherein said cover masks said central target region (Z) at least up to a first locus along said target front face (2) at which said components of the magnetic field parallel (B_r) to said target front face (2) are equal to said components of the magnetic field perpendicular (B_z) to said target front face (2) when progressing from said central target region (Z) of the target (1) towards the target margin region (A).

2. The arc source of claim 1, wherein the components of the magnetic field parallel (B_r) to said target front face (2) are larger than the components of said magnetic field perpendicular (B_z) to said target front face (2) in the region of a surface area (R′

) of at least 90% of said target front face (2).

3. The arc source of claim 1, wherein said components of the magnetic field parallel (B_r) to said target front face (2) in said surface area (R′

) are 20-60 Gauss.

4. The arc source of claim 1, wherein said components of the magnetic field parallel (B_r) to said target front face (2) are 40-50 Gauss.

5. The arc source of claim 1, wherein said cover is of at least one of:

a magnetically soft material;

a high-temperature resistant magnetic alloy; and

an electrically insulating material.

6. The arc source of claim 1, wherein said cover is in contact with said target front face (2).

7. The arc source of claim 1, wherein said cover is counter-sunk into said target front face (2).

8. The arc source of claim 7, wherein said cover is counter-sunk into said target front face (2) by 0.5 mm to 6 mm.

9. The arc source of claim 1, wherein at least a part of said magnets is counter-sunk into said target backside.

10. The arc source of claim 1, further comprising a cooling plate along said target backside, at least a part of said magnets being counter-sunk into said cooling plate.