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Pulsed plasma monitoring using optical sensor and a signal analyzer forming a mean waveform

  • US 9,200,950 B2
  • Filed: 02/25/2014
  • Issued: 12/01/2015
  • Est. Priority Date: 02/25/2014
  • Status: Active Grant
First Claim
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1. A method comprising:

  • receiving light emitted by a pulsed plasma in a semiconductor plasma processing chamber;

    sampling the received light at a sampling rate higher than a pulse rate of the pulsed plasma, wherein the sampled light has a periodic amplitude waveform and the sampling rate is higher than the period of the amplitude waveform;

    accumulating multiple sampled waveforms to form a mean waveform; and

    transmitting characteristics of the mean waveform to a chamber control tool.

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