Microwave plasma processing apparatus and microwave supplying method
First Claim
1. A microwave plasma processing apparatus comprising:
- a processing container configured to define a processing space;
a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space;
a plurality of distributors each configured to distribute the microwaves generated by the microwave generator to a plurality of waveguides stepwise sequentially;
an antenna installed in the processing container to seal the processing space, and to radiate the microwaves distributed to the plurality of waveguides by each of the plurality of distributors, to the processing space;
a monitor unit configured to monitor a voltage of each of the plurality of waveguides;
a storage unit configured to store a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the plurality of distributors corresponding to the difference to correspond to each other, for each distributor; and
a control unit configured to acquire the control value of the distribution ratio of each of the plurality of distributors, which corresponds to the difference between the monitor value of the voltage monitored by the monitor unit and the predetermined reference value of the voltage, from the storage unit and to individually control the distribution ratio of each of the plurality of distributors based on the control value acquired from the storage unit.
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Accused Products
Abstract
A microwave plasma processing apparatus includes a processing space; a microwave generator which generates microwaves for generating a plasma; a distributor which distributes the microwaves to a plurality of waveguides; an antenna installed in a processing container to seal the processing space and to radiate microwaves distributed by the distributor, to the processing space; and a monitor unit configured to monitor a voltage of each of the plurality of waveguides. A control unit acquires a control value of a distribution ratio of the distributor, which corresponds to a difference between a voltage monitor value of the monitor unit and a predetermined voltage reference value, from a storage unit that stores the difference and the control value corresponding to each other. The control unit is also configured to control the distribution ratio of the distributor, based on the acquired control value.
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Citations
5 Claims
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1. A microwave plasma processing apparatus comprising:
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a processing container configured to define a processing space; a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space; a plurality of distributors each configured to distribute the microwaves generated by the microwave generator to a plurality of waveguides stepwise sequentially; an antenna installed in the processing container to seal the processing space, and to radiate the microwaves distributed to the plurality of waveguides by each of the plurality of distributors, to the processing space; a monitor unit configured to monitor a voltage of each of the plurality of waveguides; a storage unit configured to store a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the plurality of distributors corresponding to the difference to correspond to each other, for each distributor; and a control unit configured to acquire the control value of the distribution ratio of each of the plurality of distributors, which corresponds to the difference between the monitor value of the voltage monitored by the monitor unit and the predetermined reference value of the voltage, from the storage unit and to individually control the distribution ratio of each of the plurality of distributors based on the control value acquired from the storage unit. - View Dependent Claims (2, 3, 4)
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5. A microwave supplying method using a microwave plasma processing apparatus including a processing container configured to defined a processing space, a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space, a plurality of distributors configured to distribute the microwaves to a plurality of waveguides, and an antenna installed in the processing container so as to seal the processing space and to radiating, to the processing space, the microwaves distributed to the plurality of waveguides by the distributor, the method comprising:
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monitoring a voltage of each of the plurality of waveguides; storing a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the plurality of distributors corresponding to the difference to correspond to each other, for each distributor; acquiring the control value of the distribution ratio of each of the plurality of distributors, which corresponds to the difference between the monitor value of the voltage monitored by the monitor unit and the predetermined reference value of the voltage, from the storage unit; and individually controlling the distribution ratio of each of the plurality of distributors based on the control value acquired by the acquiring, wherein the plurality of distributors each distribute the microwaves to the plurality of waveguides stepwise sequentially.
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Specification