Multi-zone EC windows

• US 9,341,912 B2
• Filed: 12/20/2013
• Issued: 05/17/2016
• Est. Priority Date: 03/13/2012
• Status: Active Grant

• Current Assignee: View Incorporated
• Original Assignee: View Incorporated
• Inventors: Shrivastava, Dhairya, Friedman, Robin, Khosla, Vinod, Mulpuri, Rao
• Primary Examiner(s): SAHLE, MAHIDERE S
• Application Number:
  US14/137,644
• Publication Number:
  US 20140177028A1
• Time in Patent Office: 879 Days
• Field of Search: 359237-239, 359/245, 359/265, 359/275
• US Class Current: 1/1
• CPC Class Codes: B23K 26/359 by providing a line or line pattern, e.g. a dotted break initiation line
• CPC Class Codes: E06B 2009/2405 Areas of differing opacity for light transmission control
• CPC Class Codes: E06B 2009/2464 featuring transparency control by applying voltage, e.g. LCD, electrochromic panels
• CPC Class Codes: E06B 3/6715 specially adapted for increased thermal insulation or for controlled passage of light E06B3/66323 takes precedence; coating of glass pains C03C17/00; devices or arrangements for controlling the intensity, colour, phase, polarisation or direction of light G02F1/00
• CPC Class Codes: E06B 3/6722 with adjustable passage of light
• CPC Class Codes: E06B 9/24 Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; Slat blindsoperating, guiding or securing devices or arrangements for roll-type closures E06B9/56; free-hanging flexible screens A47H23/00
• CPC Class Codes: G02F 1/153 Constructional details
• CPC Class Codes: G02F 1/1533 structural features not otherwise provided for
• CPC Class Codes: G09F 19/227 on windows
• CPC Class Codes: G09F 23/02 the advertising matter being displayed by the operation of the article
• CPC Class Codes: Y10T 29/49002 Electrical device making

Abstract

Thin-film devices, for example, multi-zone electrochromic windows, and methods of manufacturing are described. In certain cases, a multi-zone electrochromic window comprises a monolithic EC device on a transparent substrate and two or more tinting zones, wherein the tinting zones are configured for independent operation.

Claims

1. An electrochromic window lite comprising:

(i) a monolithic EC device on a transparent substrate, the monolithic EC device comprising first and second transparent conducting layers and an electrochromic stack between the first and second conducting layers; and

(ii) a resistive zone between each of two or more tinting zones in the monolithic EC device, each of said two or more tinting zones configured for operation independent of the others;

wherein the resistive zone has higher electrical resistivity than the remaining portions of the monolithic EC device and is configured to tint.

2. The electrochromic window lite of claim 1, wherein each of the two or more tinting zones has an associated pair of bus bars located at opposing edges.

3. The electrochromic window lite of claim 1, wherein the electrochromic window lite is incorporated into an insulated glass unit.

4. The electrochromic window lite of claim 3, wherein the IGU has a mate lite that is not an electrochromic lite.

5. The electrochromic window lite of claim 3, wherein the IGU has a mate lite that is a monolithic electrochromic lite with a single tinting zone.

6. The electrochromic window lite of claim 3, wherein the IGU has a mate lite that is a monolithic electrochromic lite with two or more tinting zones.

7. The electrochromic window lite of claim 6, wherein the tinting zones of the mate lite are aligned with those of the electrochromic window lite.

8. The electrochromic window lite of claim 3, wherein the IGU has a mate lite that is an electrochromic lite with three or more tinting zones.

9. The electrochromic window lite of claim 1, wherein at least one of the two or more tinting zones is configured to tint to <

1% T.

10. The electrochromic window lite of claim 1, wherein the resistive zone substantially spans across the length or width of the monolithic EC device.

11. The electrochromic window lite of claim 1, wherein the resistive zone is between about 1 nm wide and about 10 nm wide.

12. The electrochromic window lite of claim 11, wherein the resistive zone is formed by removing between about 10% and about 90% of the uppermost material in the second conducting layer along the resistive zone.

13. The electrochromic window lite of claim 12, wherein the resistive zone is formed by laser irradiation of at least one of the conducting layers.

14. The electrochromic lite of claim 13, wherein each of said two or more tinting zones associated bus bars are formed by laser irradiation during formation of the resistive zone by cutting through a single bus bar.

21. The electrochromic window lite of claim 1, wherein the resistive zone is formed by modification of the electrochromic stack and/or one or both of the first and second transparent conducting layers.

23. The electrochromic window lite of claim 1, wherein the resistive zone is between about 1 μ

m wide and about 1000 μ

m wide.

24. The electrochromic window lite of claim 1, wherein the resistive zone is between about 1 mm wide and about 10 mm wide.

25. The electrochromic window lite of claim 21, wherein the resistive zone is formed by a thermal/laser irradiation treatment after the electrochromic stack and first and second conducting layers are deposited on the transparent substrate.

15. A method of forming a monolithic EC device comprising two tinting zones, the method comprising:

a) forming the monolithic EC device comprising first and second transparent conductive oxide (TCO) layers and an electrochromic stack between the first and second TCO layers;

b) applying a single bus bar to the second TCO of the monolithic EC device;

c) cutting through the single bus bar along its width; and

d) forming a resistive zone between the two tinting zones in the monolithic EC device, wherein the resistive zone formed has higher electrical resistivity than the remaining portions of the monolithic EC device and is configured to tint;

wherein c) forms separate bus bars for each of the two tinting zones from the single bus bar.

16. The method of claim 15, wherein forming the resistive zone between the two tinting zones in c) comprises cutting a portion of the depth of the second TCO layer and c) and d) are performed in a single cutting step.

17. The method of claim 15, wherein the resistive zone substantially spans the width of the monolithic EC device.

18. The method of claim 15, wherein the resistive zone is between about 1 nm wide and about 10 nm wide.

19. The method of claim 15, wherein the resistive zone is formed by removing between about 10% and about 90% of the uppermost material in the second TCO layer along the resistive zone.

20. The method of claim 19, wherein the resistive zone is formed by laser irradiation of the second TCO layer.

22. The method of claim 15, wherein the resistive zone is formed by modification of the electrochromic stack and/or one or both of the first and second transparent conducting layers.