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System for the heat treatment of substrates, and method for detecting measurement data in said system

  • US 9,466,514 B2
  • Filed: 06/06/2012
  • Issued: 10/11/2016
  • Est. Priority Date: 06/06/2011
  • Status: Active Grant
First Claim
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1. Device for the heat treatment of substrates, comprising:

  • at least one heatable chamber that is a continuous furnace,a carrier system being adapted to carry substrates, where said carrier system is formed as a transport system,a sensor assembly configured for coupling to a data recording and/or data storage device, wherein said sensor assembly is disposed on a substrate formed of silicon or material having thermal properties similar to silicon,an actuator that is independent of said carrier system and coupled to said sensor assembly and is configured to move and position said sensor assembly within said heatable chamber; and

    a control device which is configured for electro-mechanical control of said actuator, so that said sensor assembly can be moved and positioned along at least one predetermined travel path,where said at least one predetermined travel path extends along a direction which is oriented perpendicular to a direction of passage, and perpendicular to a substrate surface of substrates carried by the carrier system.

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