Mask and fabrication method thereof, and method of patterning by using mask

  • US 9,488,917 B2
  • Filed: 03/16/2015
  • Issued: 11/08/2016
  • Est. Priority Date: 10/28/2014
  • Status: Active Grant
First Claim
Patent Images

1. A mask, comprising:

  • a first substrate and a second substrate disposed oppositely;

    a liquid crystal layer located between the first substrate and the second substrate;

    a transparent conductive layer formed on the first substrate, the transparent conductive layer and the liquid crystal layer being located on a same side of the first substrate; and

    a mask pattern of a non-transparent conductive material formed on the second substrate,wherein the mask pattern and the transparent conductive layer are configured to be capable of generating an electric field therebetween, so as to drive liquid crystal molecules in the liquid crystal layer to deflect.

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