Method for making carbon nanotube film

• US 9,540,242 B2
• Filed: 01/13/2013
• Issued: 01/10/2017
• Est. Priority Date: 04/25/2012
• Status: Active Grant

• Current Assignee: Beijing FUNATE Innovation Technology Co., Ltd. (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Beijing FUNATE Innovation Technology Co., Ltd. (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Feng, Chen, Qian, Li, Wang, Yu-Quan, Liu, Liang
• Primary Examiner(s): SCHIFFMAN, BENJAMIN A
• Application Number:
  US13/740,259
• Publication Number:
  US 20130285289A1
• Time in Patent Office: 1,458 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: B29C 67/24 characterised by the choice of material
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C01B 32/164 involving continuous processes
• CPC Class Codes: C01B 32/168 After-treatment
• CPC Class Codes: H01B 1/04 mainly consisting of carbon-silicon compounds, carbon or silicon

Abstract

A method for making a carbon nanotube film includes the following steps. An original carbon nanotube film is provided and includes a number of carbon nanotubes substantially joined end-to-end by van der Waals force and oriented along a first direction. A patterned carbon nanotube film is formed and defines a number of through holes arranged in at least one row in the first direction, the through holes of the at least one row includes at least two spaced though holes. The patterned carbon nanotube film is treated with a solvent such that the patterned carbon nanotube film is shrunk into the carbon nanotube film includes a number of spaced carbon nanotube linear units and a number of carbon nanotube groups, and the carbon nanotube groups are joined with the carbon nanotube linear units by van der Waals force.

Claims

1. A method for making a carbon nanotube film, comprising:

providing a carbon nanotube array;

drawing an original carbon nanotube film comprising a plurality of carbon nanotubes substantially joined end-to-end by van der Waals force and oriented along a first direction from the carbon nanotube array;

suspending the original carbon nanotube film between the carbon nanotube array and a fixing element;

irradiating the original carbon nanotube film suspended between the carbon nanotube array and a fixing element along the first direction to form a patterned carbon nanotube film, wherein a portion of the original carbon nanotube film which is irradiated is completely removed, a plurality of through holes are formed and arranged in a plurality of rows in the first direction, each row comprises at least two spaced though holes, a shape of each of the plurality of through holes is rectangular, and each of the plurality of through holes extends along the first direction;

a length of each through hole along the first direction is defined as parameter A, a width of each through hole in is defined as parameter B, a first space between adjacent through holes along the first direction is defined as parameter C, a second space between adjacent through holes at adjacent two rows is defined as parameter D, A ranges from 1 millimeter to 3 millimeters, B ranges from 0.1 millimeters to 1 millimeter, C ranges from 1 millimeter to 2.5 millimeters, and D range from 0.6 millimeters to 1 millimeter;

a first ratio of the parameter B to the parameter D is less than or equal to 2, and a second ratio of the parameter A to the parameter C is greater than or equal to 0.5; and

applying a solvent on the patterned carbon nanotube film suspended between the carbon nanotube array and a fixing element to shrink the suspended patterned carbon nanotube film into the carbon nanotube film comprising a plurality of spaced and parallel carbon nanotube linear units and a plurality of carbon nanotube groups, and the plurality of carbon nanotube groups are joined with the plurality of carbon nanotube linear units by van der Waals force, and a ratio of a first area of the plurality of carbon nanotubes to a second area of the plurality of through holes is less than or equal to 1;

19.

2. The method of claim 1, wherein the forming of the patterned carbon nanotube film comprises using a laser beam or an electron beam to irradiate the original carbon nanotube film to define the through holes in the original carbon nanotube film.

3. The method of claim 1, wherein the forming of the patterned carbon nanotube film comprises patterning the original carbon nanotube film to form the through holes, and the through holes are separated from each other and arranged in one row along the first direction in the original carbon nanotube film.

4. The method of claim 1, wherein the forming of the patterned carbon nanotube film comprises patterning the original carbon nanotube film to form the through holes, and the through holes are separated from each other and arranged in a plurality of rows along the first direction in the original carbon nanotube film.

5. The method of claim 4, wherein the through holes are arranged in a plurality of columns along a second direction in the original carbon nanotube film, the through holes arranged in a same column are spaced from each other, the second direction is crossed with the first direction.

6. The method of claim 5, wherein a length of each through hole in the first direction is greater than a space between adjacent through holes in the second direction.

7. The method of claim 5, wherein spaces between adjacent through holes in the second direction is greater than widths of the through holes in the second direction.

8. The method of claim 4, wherein the through holes are interlaced with each other in a second direction crossed with the first direction.

9. The method of claim 1, wherein the providing the original carbon nanotube film comprises providing a carbon nanotube array;

and drawing the original carbon nanotube film from the carbon nanotube array substantially along the first direction.

10. The method of claim 9, wherein the forming of the patterned carbon nanotube film comprises:

fixing one end of the original carbon nanotube film on a fixing element and suspending the original carbon nanotube film between the fixing element and the carbon nanotube array; and

then using a leaser beam or an electron beams irradiate the original carbon nanotube film to form the patterned carbon nanotube film.

11. The method of claim 1, wherein the solvent is selected from at least one of the group consisting of alcohol, methanol, acetone, dichloroethane, chloroform, and water.

12. The method of claim 1, wherein A is 3 millimeter, B is 1 millimeter, C is 1 millimeter, and D is 1 millimeter.

13. The method of claim 1, wherein the ratio is less than or equal to 1:

49.

14. The method of claim 1, wherein the parameter A is 3 millimeters, the parameter B is 0.7 millimeters, the parameter C is 1 millimeter, and the parameter D is 0.8 millimeters.

15. The method of claim 1, wherein the parameter A is 2.0 millimeters, the parameter B is 0.5 millimeters, the parameter C is 2.0 millimeters, and the parameter D is 1 millimeter.