Systems and methods for polymer tips using silanated supports

• US 9,618,840 B2
• Filed: 11/19/2013
• Issued: 04/11/2017
• Est. Priority Date: 11/20/2012
• Status: Active Grant

• Current Assignee: New York University
• Original Assignee: New York University
• Inventors: Braunschweig, Adam B., Zhong, Xiao, Schesing, Kevin B., Bian, Shudan
• Primary Examiner(s): Stoffa, Wyatt
• Application Number:
  US14/083,981
• Publication Number:
  US 20140141167A1
• Time in Patent Office: 1,239 Days
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 7/2049 using a cantilever

Abstract

Polymer Pen Lithography materials that retain the simplicity characteristic for the fabrication of poly(dimethyl siloxane) tip arrays while preserving the control over feature dimensions and to understand the role of the mechanical properties of the different materials on Polymer Pen Lithography printing.

Claims

1. A method of synthesizing tips for polymer pen lithography comprising:

silanating a support structure comprising a glass material;

selecting a polymer selected from the group consisting of methacrylates, acrylates, elastomers, thiol-ene polymers and co-polymers thereof;

depositing the selected polymer into molds;

covering the molds with the glass support structure, the polymer adhering to the support structure; and

removing the support structure and tips which comprise the selected polymer from the molds;

wherein silanating is done prior to covering the molds and comprises;

immersing the glass support structure in an acid bath;

removing the glass support structure from the acid bath;

drying the glass support structure with an inert gas;

placing the dried glass support structure in an organic silane solution comprising 3-methacryloxypropyltrimethoxysilane (MEMO) and toluene.

2. The method of claim 1, wherein the polymer is selected from the group consisting of poly(methyl methacrylate) (PMMA), poly([methyl methacrylate]-co-[butyl methacrylate]) (PMMA-co-PBMA), and poly(3-mercaptopropylmethylsiloxane) (PMMS).

3. The method of claim 1, further comprising adding a crosslinker.

4. The method of claim 3 wherein the crosslinker is hydrophilic.

5. The method of claim 1, wherein prior to immersion in the acid bath:

immersing the glass substrate in an acid/alcohol bath;

removing the glass substrate from the acid/alcohol bath; and

drying the glass substrate with the inert gas.

6. A method of synthesizing tips for polymer pen lithography comprising:

silanating a support structure comprising a glass material, by;

immersing the glass support substrate in an acid/alcohol bath;

removing the glass support substrate from the acid/alcohol bath; and

drying the glass support substrate with the inert gas;

followed by;

immersing the glass support substrate in an acid bath;

removing the glass support substrate from the acid bath;

drying the glass support substrate with an inert gas;

placing the dried glass support substrate in an organic silane solution;

selecting a polymer selected from the group consisting of methacrylates, acrylates, elastomers, thiol-ene polymers and co-polymers thereof;

depositing the selected polymer into molds;

covering, after silanating, the molds with a support structure, the polymer adhering to the support structure; and

removing the support structure and tips which comprise the selected polymer from the molds.

7. The method of claim 6, wherein the polymer is selected from the group consisting of poly(methyl methacrylate) (PMMA), poly([methyl methacrylate]-co-[butyl methacrylate]) (PMMA-co-PBMA), and poly(3-mercaptopropylmethylsiloxane) (PMMS).

8. The method of claim 6, further comprising adding a crosslinker.

9. The method of claim 8 wherein the crosslinker is hydrophilic.

10. The method of claim 6, wherein the organic silane solution comprises 3-methacryloxypropyltrimethoxysilane (MEMO) and toluene.