RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion source
First Claim
1. A plasma source for processing or imaging a substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators comprising:
- a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage;
a gas source coupled to the reactor chamber to provide gas into the reaction chamber;
an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber;
and a magnetic circuit comprising a source of magnetic flux that is electrically isolated from the reactor chamber and located at ground potential, and a high permeability magnetic circuit formed of magnetic permeability material in physical contact with the reactor chamber and located adjacent the reactor chamber exit aperture, with said magnetic circuit configured to produce a transverse DC magnetic field adjacent the exit aperture of the reactor chamber and channel magnetic flux through a high voltage gap to provide magnetic flux into the reactor chamber, with one portion of the circuit containing a high magnetic permeability material, the one portion being biased to high voltage and electrically isolated from another portion of the magnetic circuit by a dielectric fluid.
1 Assignment
0 Petitions
Accused Products
Abstract
In a plasma ion source having an induction coil adjacent to a reactor chamber for inductively coupling power into the plasma from a radio frequency power source and designed for negative and positive ion extraction, a method for operating the source according to the invention comprises providing radio frequency power to the induction coil with a RF amplifier operating with a variable frequency connected to a matching network mainly comprised of fixed value capacitors. In this device the impedance between the RF power source and the plasma ion source is matched by tuning the RF frequency rather than adjusting the capacitance of the matching network. An option to use a RF power source utilizing lateral diffused metal oxide semiconductor field effect transistor based amplifiers is disclosed.
-
Citations
11 Claims
-
1. A plasma source for processing or imaging a substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators comprising:
-
a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; and a magnetic circuit comprising a source of magnetic flux that is electrically isolated from the reactor chamber and located at ground potential, and a high permeability magnetic circuit formed of magnetic permeability material in physical contact with the reactor chamber and located adjacent the reactor chamber exit aperture, with said magnetic circuit configured to produce a transverse DC magnetic field adjacent the exit aperture of the reactor chamber and channel magnetic flux through a high voltage gap to provide magnetic flux into the reactor chamber, with one portion of the circuit containing a high magnetic permeability material, the one portion being biased to high voltage and electrically isolated from another portion of the magnetic circuit by a dielectric fluid. - View Dependent Claims (2, 3, 4)
-
-
5. A plasma source for processing or imaging a substrate, ion source for proton therapy, secondary ion mass spectrometry, ion thrusters, and high energy particle accelerators comprising:
-
a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture biased to high voltage coupled to the reactor chamber to allow extraction of ions from the reactor chamber; a transverse magnetic field applied at the exit aperture via a magnetic circuit configured with outer magnetic poles biased at ground potential formed outside a lateral expanse of the reactor chamber and inner magnetic poles biased at the reactor chamber voltage and located within the lateral expanse of the reactor chamber; a first source of radio frequency power; and a plurality of induction coils adjacent to the reactor chamber and coupled to said first source of radio frequency power to inductively couple power into the plasma from said first source of radio frequency power. - View Dependent Claims (11)
-
-
6. A plasma source for processing or imaging a substrate, ion source for proton therapy, ion thrusters, and high energy particle accelerators comprising:
-
a reactor chamber within which a plasma is generated to produce at least one plasma product for processing or imaging the substrate, secondary ion mass spectrometry, ion source for proton therapy, ion thrusters, and high energy particle accelerators, the reactor chamber including outer walls that are actively biased to a high voltage; a gas source coupled to the reactor chamber to provide gas into the reaction chamber; an exit aperture coupled to the reactor chamber to allow extraction of ions from the reactor chamber; and an insulator made up of a capillary or tube with an inner diameter much smaller than its length, where the insulator has a spiral, serpentine, or coiled path to reduce the electric field along the tube or capillary length. - View Dependent Claims (7, 8, 9, 10)
-
Specification