Methods of forming a gyroscope sensor and a structure for a gyroscope sensors
First Claim
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1. A method of forming a structure for a gyroscope sensor, the method comprising:
- forming a first dielectric over a substrate;
forming a material layer over the dielectric;
removing a first portion of the material layer to form a recess;
removing a second portion of the material layer to define a gyro disk surrounded by a frame, and a first channel between the gyro disk and the frame;
forming a second channel in the substrate corresponding to the first channel; and
removing a portion of the first dielectric to form a second dielectric between the gyro disk and the substrate.
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Abstract
A method of forming a structure for a gyroscope sensor includes forming a first dielectric over a substrate and a material layer over the first dielectric layer. A first portion of the material layer is removed to form a recess and a second portion of the material layer is removed to define a first channel between a gyro disk and a frame. A second channel is formed in the substrate corresponding to the first channel, and a portion of the first dielectric is removed to form a second dielectric between the gyro disk and the substrate.
21 Citations
20 Claims
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1. A method of forming a structure for a gyroscope sensor, the method comprising:
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forming a first dielectric over a substrate; forming a material layer over the dielectric; removing a first portion of the material layer to form a recess; removing a second portion of the material layer to define a gyro disk surrounded by a frame, and a first channel between the gyro disk and the frame; forming a second channel in the substrate corresponding to the first channel; and removing a portion of the first dielectric to form a second dielectric between the gyro disk and the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of forming a gyroscope sensor, the method comprising:
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forming a gyro disk structure, forming the gyro disk structure comprising; forming a first dielectric over a substrate; forming a material layer over the first dielectric; removing a first portion of the material layer to form a recess, the recess comprising a first channel; removing a second portion of the material layer to define a gyro disk surrounded by a frame, and a second channel between the gyro disk and the frame; forming a third channel in the substrate corresponding to the second channel; and removing a portion of the first dielectric to form a second dielectric between the gyro disk and the substrate; configuring a first light source to provide a first light beam through the first channel or through the second channel and the third channel; and configuring a first light receiver to receive the first light beam. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A method of forming a gyroscope sensor, the method comprising:
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forming a gyro disk structure, forming the gyro disk structure comprising; forming a first dielectric over a substrate; forming a material layer over the dielectric; removing a first portion of the material layer to form a recess; removing a second portion of the material layer to define a gyro disk surrounded by a frame, and a first channel between the gyro disk and the frame; forming a second channel in the substrate corresponding to the first channel; removing a portion of the first dielectric to form a second dielectric between the gyro disk and the substrate; configuring a light source to provide a light beam through the first channel and the second channel; and configuring a light receiver to receive the light beam.
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Specification