Sputtering apparatus including gas distribution system
First Claim
1. A magnetron sputtering apparatus, comprising:
- a vacuum chamber providing a controlled environment;
a cylindrical target comprising one or more sputterable materials, wherein the cylindrical target includes a sputtering zone that is racetrack shaped and extends longitudinally along a longitudinal axis, and the sputtering zone includes two straightaway areas sandwiched between first and second turnaround areas;
a gas distribution system comprising a plurality of interfaces extending along the longitudinal axis, wherein the plurality of interfaces includes a plurality of first interfaces and a plurality of second interfaces, the first interfaces positioned at each of the first and second turnaround areas to supply a first gas mixture to both of the first and second turnaround areas, such that the first gas mixture controls sputtering rate at localized areas of both of the first and second turnaround areas, whereas the second interfaces are positioned at each of the two straightaway areas to supply a second gas mixture to both of the two straightaway areas, such that the second gas mixture controls sputtering rate at localized areas of both of the two straightaway areas, the first interfaces positioned along first and third longitudinal distances, the second interfaces positioned along a second longitudinal distance, such that the first, second, and third longitudinal distances do not overlap;
wherein the first gas mixture is supplied to the first interfaces and the second gas mixture is supplied to the second interfaces, wherein the first gas mixture includes a single inert gas or two or more inert gases having a first atomic weight, and the second gas mixture includes a single inert gas or two or more inert gases having a second atomic weight, wherein the first atomic weight is an atomic weight of the single inert gas or an average atomic weight of the two or more inert gases in the first gas mixture and the second atomic weight is an atomic weight of the single inert gas or an average atomic weight of the two or more inert gases in the second gas mixture, and wherein the first atomic weight is different from the second atomic weight, the second atomic weight being heavier than the first atomic weight, the gas distribution system thereby providing more uniform sputtering rates across the first and second turnaround areas and the two straightaway areas than if only an argon gas atmosphere were provided to the first and second turnaround areas and the two straightaway areas, and wherein each of the first gas mixture and the second gas mixture is free of reactive gas.
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Accused Products
Abstract
Some embodiments provide a magnetron sputtering apparatus including a vacuum chamber within which a controlled environment may be established, a target comprising one or more sputterable materials, wherein the target includes a racetrack-shaped sputtering zone that extends longitudinally along a longitudinal axis and comprises a straightaway area sandwiched between a first turnaround area and a second turnaround area, a gas distribution system that supplies a first gas mixture to the first turnaround area and/or the second turnaround area and supplies a second gas mixture to the straightaway area, wherein the first gas mixture reduces a sputtering rate relative to the second gas mixture. In some cases, the first gas mixture includes inert gas having a first atomic weight and the second gas mixture includes inert gas having a second atomic weight, wherein the second atomic weight is heavier than the first atomic weight.
28 Citations
13 Claims
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1. A magnetron sputtering apparatus, comprising:
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a vacuum chamber providing a controlled environment; a cylindrical target comprising one or more sputterable materials, wherein the cylindrical target includes a sputtering zone that is racetrack shaped and extends longitudinally along a longitudinal axis, and the sputtering zone includes two straightaway areas sandwiched between first and second turnaround areas; a gas distribution system comprising a plurality of interfaces extending along the longitudinal axis, wherein the plurality of interfaces includes a plurality of first interfaces and a plurality of second interfaces, the first interfaces positioned at each of the first and second turnaround areas to supply a first gas mixture to both of the first and second turnaround areas, such that the first gas mixture controls sputtering rate at localized areas of both of the first and second turnaround areas, whereas the second interfaces are positioned at each of the two straightaway areas to supply a second gas mixture to both of the two straightaway areas, such that the second gas mixture controls sputtering rate at localized areas of both of the two straightaway areas, the first interfaces positioned along first and third longitudinal distances, the second interfaces positioned along a second longitudinal distance, such that the first, second, and third longitudinal distances do not overlap; wherein the first gas mixture is supplied to the first interfaces and the second gas mixture is supplied to the second interfaces, wherein the first gas mixture includes a single inert gas or two or more inert gases having a first atomic weight, and the second gas mixture includes a single inert gas or two or more inert gases having a second atomic weight, wherein the first atomic weight is an atomic weight of the single inert gas or an average atomic weight of the two or more inert gases in the first gas mixture and the second atomic weight is an atomic weight of the single inert gas or an average atomic weight of the two or more inert gases in the second gas mixture, and wherein the first atomic weight is different from the second atomic weight, the second atomic weight being heavier than the first atomic weight, the gas distribution system thereby providing more uniform sputtering rates across the first and second turnaround areas and the two straightaway areas than if only an argon gas atmosphere were provided to the first and second turnaround areas and the two straightaway areas, and wherein each of the first gas mixture and the second gas mixture is free of reactive gas. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification