Imprint apparatus, imprint method, and method of manufacturing article

• US 9,823,562 B2
• Filed: 05/28/2014
• Issued: 11/21/2017
• Est. Priority Date: 05/30/2013
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Nishikawara, Tomofumi, Nakagawa, Kazuki
• Primary Examiner(s): Del Sole, Joseph S
• Assistant Examiner(s): Robitaille, John
• Application Number:
  US14/288,435
• Publication Number:
  US 20140353865A1
• Time in Patent Office: 1,273 Days
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Abstract

The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performing imprint processing for a target shot region as a shot region to undergo imprint processing based on heating control information used to heat, by the heating unit, a shot region which has undergone imprint processing prior to the target shot region, the control unit controls heating of the substrate by the heating unit so that a shape of the target shot region which has been deformed by heating of the substrate according to the control information becomes close to a target shape.

Claims

1. An imprint apparatus for forming a pattern in first and second shot regions on a substrate by performing, at each of the first and second shot regions, imprint processing of forming the pattern of an imprint material on the substrate using a mold, the apparatus comprising:

a heating unit configured to deform each of the first and second shot regions by heating the substrate; and

a control unit configured to control the heating unit,

wherein the control unit obtains first heating control information for controlling heating of the first shot region by the heating unit and second heating control information for controlling heating of the second shot region by the heating unit,

wherein the second heating control information is set using the first heating control information so that the second shot region becomes close to a target shape by deformation of the second shot region by the heating of the first shot region using the first heating control information and deformation of the second shot region by the heating of the second shot region using the second heating control information,

wherein the control unit controls heating of the first shot region using the obtained first heating control information and controls the imprint processing of the first shot region deformed by the heating of the first shot region, and

wherein the control unit controls heating of the second shot region using the obtained second heating control information and controls the imprint processing of the second shot region deformed by the heating of the first shot region and the heating of the second shot region.

2. The apparatus according to claim 1, wherein

based on the first heating control information, the control unit determines a deformation amount of the second shot region, which is caused by heating of the first shot region using the first heating control information, and

the control unit determines the shape of the second shot region which has been deformed by heating of the first shot region using the first heating control information, by using the deformation amount and the shape of the second shot region obtained before heating of the first shot region using the first heating control information.

3. The apparatus according to claim 2, wherein the control unit controls heating by the heating unit so that the shape of the second shot region becomes close to the target shape based on a distribution obtained by combining each heating distribution for correcting each of the plural types of deformation components of a shape difference indicating a difference between the target shape and the shape of the second shot region deformed by heating of the first shot region using the first heating control information.

4. The apparatus according to claim 1, wherein the first heating control information contains information about a heat quantity to be applied to the first shot region by the heating unit.

5. The apparatus according to claim 1, wherein the control unit weights the first heating control information according to an elapsed time from when the heating unit performs heating of the first shot region.

6. The apparatus according to claim 1, wherein the control unit weights the first heating control information according to a position on the first shot region in the substrate, which has been heated by the heating unit.

7. The apparatus according to claim 1, wherein the control unit determines the first heating control information based on deformation information about a deformation amount in the second shot region, which is generated by heating of the first shot region based on the first heating control information and remains in imprint processing of the second shot region.

8. The apparatus according to claim 7, wherein the control unit determines the first heating control information using the deformation information so that the shape of the second shot region becomes close to the target shape.

9. The apparatus according to claim 1, wherein the control unit determines the second heating control information based on deformation information about a deformation amount in a third shot region undergoing imprint processing after the second shot region, which is generated by heating of the second shot region based on the second heating control information and remains in imprint processing of the third shot region.

10. The apparatus according to claim 9, wherein the control unit determines the second heating control information using the deformation information so that a shape of the third shot region becomes close to the target shape for the third shot region.

11. The apparatus according to claim 1, further comprising an alignment measurement unit configured to measure a shape difference between a pattern region of the mold and a shot region of the substrate,

wherein the control unit causes the alignment measurement unit to measure a shape difference between the pattern region of the mold and the second shot region of the substrate during an imprint processing for the second shot region,

wherein in a case where the shape difference between the pattern region of the mold and the second shot region does not fall within a tolerance range, the control unit controls the heating unit so that the shape difference falls within the tolerance range.

12. The apparatus according to claim 1, wherein

the second heating control information is determined based on a deformation amount of the second shot region deformed by heating of the first shot region in accordance with the first heating control information.

13. An imprint apparatus for forming a pattern in first and second shot regions on a substrate by performing, at each of the first and second shot regions, imprint processing of forming the pattern of an imprint material on the substrate using a mold, the apparatus comprising:

a heater configured to deform each of the first and second shot regions by heating the substrate; and

a controller configured to control the heater,

wherein the controller is configured to obtain first heating control information for controlling heating of the first shot region by the heater and second heating control information for controlling heating of the second shot region by the heater,

wherein the second heating control information is set using the first heating control information so that the second shot region becomes close to a target shape by deformation of the second shot region by the heating of the first shot region using the first heating control information and deformation of the second shot region by the heating of the second shot region using the second heating control information,

wherein the controller is configured to control heating of the first shot region using the obtained first heating control information and control the imprint processing of the first shot region deformed by the heating of the first shot region, and

wherein the controller is configured to control heating of the second shot region using the obtained second heating control information and controls the imprint processing of the second shot region deformed by the heating of the first shot region and the heating of the second shot region.