Accelerated life testing device and method

• US 9,885,650 B2
• Filed: 01/15/2016
• Issued: 02/06/2018
• Est. Priority Date: 11/21/2013
• Status: Active Grant

• Current Assignee: Medtronic Minimed Incorporated (Medtronic Plc)
• Original Assignee: Medtronic Minimed Incorporated (Medtronic Plc)
• Inventors: Yap, Darren Y. K., Holmes, Alexander E.
• Primary Examiner(s): Macchiarolo, Peter
• Assistant Examiner(s): Megna Fuentes, Anthony W
• Application Number:
  US14/997,252
• Publication Number:
  US 20160131571A1
• Time in Patent Office: 753 Days
• Field of Search: 738659, 7386652, 734321, 738656
• CPC Class Codes: G01N 17/002 Test chambers
• CPC Class Codes: H01L 21/67 Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere processes per se H01L21/30, H01L21/46, H01L23/00; simple temporary support means, e.g. using adhesives, electric or magnetic means H01L21/68, H01L21/302; apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto H01L24/74;

Abstract

An accelerated life testing device and method including an accelerated life testing method for a test piece within a test chamber, the method including: establishing a first atmosphere within the test chamber; changing the first atmosphere to a second atmosphere to form a deposition layer on the test piece; changing the second atmosphere to the first atmosphere to remove the deposition layer from the test piece; and repeating the changing the first atmosphere to the second atmosphere and the changing the second atmosphere to the first atmosphere to form an oxidation layer on the test piece.

Claims

1. A qualitative testing device comprising:

an enclosure suitable for establishing an atmosphere around a test piece; and

an atmospheric controller operatively connected to the enclosure, the atmospheric controller operable to repeatedly change between atmospheres in the enclosure to alternately form and remove a deposition layer on the test piece, causing an oxidation layer to form on the test piece.

2. The qualitative testing device of claim 1, wherein the atmospheric controller further comprises at least one sensor and at least one control system that monitors and controls atmospheric conditions within the enclosure.

3. The qualitative testing device of claim 1, wherein the atmospheric controller further comprises a temperature controller operable to control temperature within the enclosure, and a humidity controller operable to control humidity within the enclosure.

4. The qualitative testing device of claim 3, wherein the temperature controller and the humidity controller are located within the enclosure or within a loop through which air or other gases are withdrawn from and returned to the enclosure.

5. The qualitative testing device of claim 1, wherein the test piece comprises at least one metal surface on which the oxidation layer forms.

6. The qualitative testing device of claim 1, wherein the enclosure further comprises a test chamber that provides a closed atmosphere that is substantially sealed from an outside environment.

7. The qualitative testing device of claim 1, wherein the enclosure further comprises a test chamber that provides an open atmosphere.

8. The qualitative testing device of claim 1, wherein the test piece further comprises a circuit board.

9. The qualitative testing device of claim 1, wherein the oxidation layer further comprises copper oxide.

10. A qualitative testing method comprising:

alternately forming and removing a deposition layer on a test piece located in an enclosure by repeatedly changing an atmosphere within the enclosure; and

forming an oxidation layer on the test piece as a result of the alternately forming and removing the deposition layer.

11. The method of claim 10, wherein the removing the deposition layer further comprises partially removing the deposition layer, wherein a portion of the deposition layer is left on the test piece;

and forming a next deposition layer on top of the portion that is left.

12. The method of claim 10, wherein the repeatedly changing the atmosphere further comprises changing from a first atmosphere to a second atmosphere and changing from the second atmosphere to another atmosphere, wherein the another atmosphere is different than the first atmosphere.

13. The method of claim 10, further comprising sensing an atmospheric condition within the enclosure.

14. The method of claim 13, wherein the sensing the atmospheric condition further comprises sensing temperature, humidity, or a combination thereof.

15. The method of claim 13, further comprising controlling the atmospheric condition within the enclosure based on the sensing the atmospheric condition.

16. A method of accelerated life testing, the method comprising:

forming a deposition layer on a test piece by changing a first atmosphere to a second atmosphere within a test chamber containing the test piece;

removing the deposition layer from the test piece by changing the second atmosphere to another atmosphere;

alternately forming and removing the deposition layer on the test piece by repeatedly changing between atmospheres; and

forming an oxidation layer on the test piece from the alternately forming and removing the deposition layer on the test piece.

17. The method of claim 16, wherein the changing the first atmosphere to the second atmosphere further comprises setting a temperature of the test piece below a dew point of the second atmosphere, wherein the deposition layer is liquid water.

18. The method of claim 16, wherein the changing the first atmosphere to the second atmosphere further comprises setting a temperature of the test piece below a frost point of the second atmosphere, wherein the deposition layer is frost or ice.

19. The method of claim 16, wherein the changing the second atmosphere to another atmosphere further comprises changing the second atmosphere to the first atmosphere or to an atmosphere different than the first atmosphere.

20. The method of claim 16, wherein the forming the oxidation layer further comprises alternately forming and removing the deposition layer on the test piece for a predetermined number of times or for a predetermined duration.