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Method for monitoring an operation location of a surface processing apparatus, and monitoring system

  • US 9,961,492 B2
  • Filed: 06/01/2016
  • Issued: 05/01/2018
  • Est. Priority Date: 12/02/2013
  • Status: Active Grant
First Claim
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1. A method for monitoring an operation location of a surface processing apparatus, wherein the surface processing apparatus is allocated to a spatially delimited operation area by way of an allocating unit, the position of the surface processing apparatus is established and it is determined whether the surface processing apparatus is disposed inside or outside the operation area, the method comprising:

  • allocating the surface processing apparatus to a first operation area and at least one second operation area that is spatially separated from the first operation area;

    determining whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area;

    sending position data of the surface processing apparatus to a report unit and sending at least one report from the report unit to at least one member of the operating personnel if the surface processing apparatus is not disposed in the first operation area;

    wherein the at least one report differs, in dependence on where outside the first operation area the surface processing apparatus is disposed, at least in respect of the at least one member of the operating personnel to whom the at least one report is directed.

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