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Radio-frequency devices with gate node voltage compensation

  • US 9,973,184 B2
  • Filed: 01/20/2016
  • Issued: 05/15/2018
  • Est. Priority Date: 07/07/2012
  • Status: Active Grant
First Claim
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1. A semiconductor die comprising:

  • a semiconductor substrate;

    a first field-effect transistor formed on the semiconductor substrate and including a first gate node;

    a second field-effect transistor connected in series with the first field-effect transistor and including a second gate node;

    a third field-effect transistor connected in series with the second field-effect transistor and including a third gate node;

    a first capacitor that is directly connected at a first end to the first gate node, directly connected at a second end to the second gate node, and configured to block DC current flow between the first gate node and the second gate node; and

    a second capacitor that is directly connected at a first end to the second gate node, directly connected at a second end to the third gate node, and configured to block DC current flow between the second gate node and the third gate node.

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