Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same

  • US 9,982,177 B2
  • Filed: 01/20/2011
  • Issued: 05/29/2018
  • Est. Priority Date: 03/12/2010
  • Status: Active Grant
First Claim
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1. A slurry comprising abrasive grains and water,the abrasive grains including particles comprising a hydroxide of tetravalent cerium, the abrasive grains producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %.

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