Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate

  • US 9,988,573 B2
  • Filed: 11/21/2011
  • Issued: 06/05/2018
  • Est. Priority Date: 11/22/2010
  • Status: Active Grant
First Claim
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1. A slurry comprising abrasive grains and water,the abrasive grains including a tetravalent metal element hydroxide, and producing absorbance of at least 1.50 for light with a wavelength of 400 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %, and producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %.

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