Radiation sensitive resin composition

  • US RE37,179 E1
  • Filed: 10/21/1999
  • Issued: 05/15/2001
  • Est. Priority Date: 12/03/1993
  • Status: Expired due to Term
First Claim
Patent Images

1. A radiation sensitive resin composition which consists essentially of (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units A and B represented by the general formulas (1) and (2), respectively, and a recurring unit C which acts to reduce the solubility of the polymer in an alkali developer after the irradiation:

  • wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group, and wherein the recurring unit C is derived from at least one organic compound which is free from any acidic substituent and selected from the group consisting of styrene, α

    -methylstyrene, p-methylstyrene, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, (meth) acrylamide and (meth) arylonitrile.

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