Printing sub photo etching image by using shadow arbor and eccentric shaft exposure

Printing sub photo etching image by using shadow arbor and eccentric shaft exposure

  • CN 100,407,052 C
  • Filed: 10/14/1999
  • Issued: 07/30/2008
  • Est. Priority Date: 10/30/1998
  • Status: Active Grant
First Claim
Patent Images

1. the method for a limiting structure on substrate may further comprise the steps:

  • A. deposit shadow arbor layer on substrate;

    B. erode away groove in the shadow arbor layer, groove has sidewall and bottom;

    C. deposit photoresist layer on shadow arbor layer and groove;

    D. the photoresist layer that exposes at a certain angle makes the photoresist of channel bottom first be exposed and the photoresist of channel bottom second portion is stopped by trenched side-wall and is not exposed;

    E. the photoresist layer develops;

    AndF. use the photoresist layer limiting structure that develops.

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