Method for preparation silicon layer with vapor-phase deposition technique on the surface of base material

Method for preparation silicon layer with vapor-phase deposition technique on the surface of base material

  • CN 101,008,079 A
  • Filed: 01/24/2007
  • Published: 08/01/2007
  • Est. Priority Date: 01/25/2006
  • Status: Active Application
First Claim
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1. one kind begins to prepare the method for silicon layer by vapour deposition at substrate surface from the precursor based on silicon, it is characterized in that, uses silicon tetrachloride as precursor.

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