Pattern forming method

Pattern forming method

  • CN 101,051,183 B
  • Filed: 01/17/2007
  • Issued: 04/24/2013
  • Est. Priority Date: 01/18/2006
  • Status: Active Grant
First Claim
Patent Images

1. a pattern formation method is pressed into the transparent mould that has formed the pattern of concaveconvex shape on the substrate that has been coated with resin molding, thereby this relief pattern is transferred on the substrate surface, it is characterized in that:

  • Described mould has the alignment mark that is used for determining the relative position relation between substrate and the mould more than 2 at concentric circles, utilize the relative position relation between the end of described alignment mark and substrate circular open section, carry out the position alignment between mould and the substrateDescribed alignment mark is circular arc,The described substrate circular open of the concentric circles radius ratio section radius that has formed described alignment mark is little.

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