Process for producing silicon oxide films from organoaminosilane precursors

Process for producing silicon oxide films from organoaminosilane precursors

  • CN 101,078,109 B
  • Filed: 05/23/2007
  • Issued: 05/29/2013
  • Est. Priority Date: 05/23/2006
  • Status: Active Grant
First Claim
Patent Images

1. one kind forms the method for silicon oxide film at substrate, and the method comprises:

  • Silane precursor reaction by oxygenant and following formula are represented forms silicon oxide film with chemical gas-phase deposition method at substrate,

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