Composition for forming antireflection film, layered product, and method of forming resist pattern

Composition for forming antireflection film, layered product, and method of forming resist pattern

  • CN 101,080,674 A
  • Filed: 11/28/2005
  • Published: 11/28/2007
  • Est. Priority Date: 12/03/2004
  • Status: Active Application
First Claim
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1. form the composition of anti-reflective film, comprise:

  • (A) has at least one by the repetitive of following general formula (1) expression with at least one is by the multipolymer of the repetitive of following general formula (2) expression and/or the salt of this multipolymer;

    With(B) surfactant, the surface tension of the aqueous solution of this surfactant under the concentration of 25 ℃

    temperature and 0.1wt%b are 45mN/m or still less;

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