Composition for underlayer film of resist and process for producing the same

Composition for underlayer film of resist and process for producing the same

  • CN 101,133,364 B
  • Filed: 02/24/2006
  • Issued: 03/20/2013
  • Est. Priority Date: 03/01/2005
  • Status: Active Grant
First Claim
Patent Images

1. resist composition for underlayer film is characterized in that containing:

  • (I) contain the condensation product of potpourri of the silane compound of the silane compound of following general formula (A) expression and following general formula (B) expression, and(II) contain the condensation product of potpourri of the silane compound of following general formula (C) expression,R 1Si(OR 3) 3 ...(A) In the formula (A), R 1Expression contains 1 valency organic group of aromatic rings, R 3Represent independently 1 valency organic group, R 1Be OR 3Organic group beyond the base, Si(OR 3) 4 ...(B) In the formula (B), R 3Represent 1 valency organic group, R 4dSi(OR 3) 4-d ...(C) In the formula (C), R 3Represent 1 valency organic group, R 4Represent independently methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, sec-butyl or the tert-butyl group, d represents 1~

    3 integer.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×