Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

  • CN 101,176,041 A
  • Filed: 04/26/2006
  • Published: 05/07/2008
  • Est. Priority Date: 05/17/2005
  • Status: Active Application
First Claim
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1. eurymeric resist composition, it is the eurymeric resist composition that contains the base material component (A) that alkali solubility increases under the effect of acid and utilize the acidic acid agent composition of exposure (B), wherein,Described base material component (A) contains:

  • the described phenol hydroxyl that has 2 above phenol hydroxyls and molecular weight and be in 300~

    2500 the polyphenol compound (a) is suppressed the compound (A1) of base protection by the acid dissociation dissolving, and,Standard deviation (the σ

    of the protection number (individual) of each molecule of described compound (A1) n) less than 1.

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