Positive resist composition and method of forming resist pattern

Positive resist composition and method of forming resist pattern

  • CN 101,176,041 B
  • Filed: 04/26/2006
  • Issued: 12/11/2013
  • Est. Priority Date: 05/17/2005
  • Status: Active Grant
First Claim
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1. an eurymeric anti-corrosion agent composition, it is the eurymeric anti-corrosion agent composition that contains the base material component A that alkali solubility increases under sour effect and utilize the acidic acid agent composition B of exposure, wherein,Described base material component A contains:

  • the described phenol hydroxyl had in the polyphenol compound a that 2 above phenol hydroxyls and molecular weight are 300~

    2500 is acid hydrolysis from the compd A 1 of property dissolution inhibition base protection,The ratio of compd A 1 described in described base material component A is 100 quality %, and the protection ratio mean value of every a part of described compd A 1 is 7~

    45 % by mole,And the standard deviation sigma of the protection number of every a part of described compd A 1 nless than 1, Described polyphenol compound a is the compound that following general formula (I) means,[changing 1]

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