Method for multi-exposure beam lithography device

Method for multi-exposure beam lithography device

  • CN 101,194,208 A
  • Filed: 04/19/2005
  • Published: 06/04/2008
  • Est. Priority Date: 04/15/2005
  • Status: Active Application
First Claim
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1. method of using a plurality of exposure beam composition workpiece simultaneously, described workpiece to small part is covered by the layer to electromagnetic radiation sensitivity, said method comprising the steps of:

  • By adjusting the amount of at least one exposure beam in described a plurality of exposure beam, the distance between the compensation adjacent exposure beams departs from nominal value, thereby reduces the critical dimension error in the above pattern of described workpiece.

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