Plasma coating system for coating of substrates

Plasma coating system for coating of substrates

  • CN 101,208,156 B
  • Filed: 10/27/2004
  • Issued: 04/01/2015
  • Est. Priority Date: 07/30/2004
  • Status: Active Grant
First Claim
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1. for carrying out the plasma coating system of consistent coating to substrate,Described system comprises at least one coating platform (28,32), it comprises the path (38) with at least one bend (40), and wherein said path (38) are specified by the first side and the second side relative with described first side;

  • Above-mentioned first side or the second side of above-mentioned bend (40) are provided with the first plasma orphan (42 or

         44), described first plasma arc (42 or

         44) is configured to plasma spraying conductance to the substrate (37) in described bend (40)It is characterized in that,Above-mentioned first plasma arc (42 or

         44) has line of symmetry or symmetrical plane, and the distance along above-mentioned line of symmetry or symmetrical plane between above-mentioned first plasma arc (42 or

         44) and aforesaid substrate (37) defines the first operating distance;

    Distance along above-mentioned line of symmetry or symmetrical plane between the side relative with above-mentioned first plasma arc (42 or

         44) of described bend and aforesaid substrate (37) defines the second operating distance;

    And when described substrate (37) moves through above-mentioned first plasma arc (42 or

         44) and passes through above-mentioned bend (40), above-mentioned first operating distance and the second operating distance are configured to keep roughly the same.

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