Auto-stopping abrasive composition for polishing high step height oxide layer

Auto-stopping abrasive composition for polishing high step height oxide layer

  • CN 101,208,404 A
  • Filed: 04/28/2006
  • Published: 06/25/2008
  • Est. Priority Date: 04/28/2005
  • Status: Active Application
First Claim
Patent Images

1. have the chemical-mechanical polishing composition of automatic hold function, it comprises:

  • I) metal oxide abrasive grains;

    WithCompound below ii) at least a being selected from the group;

    the hydroxycarboxylic acid that the amino alcohol that Chemical formula 1 is represented, Chemical formula 2 are represented or its salt, or their mixture;

    Chemical formula 1;

    R 1-N (R 2)-A-OH Chemical formula 2;

    (OH) n-R-(COOH) mWherein, A represents to have the straight chain or the branched alkylidene of 2-5 carbon atom, R 1And R 2Represent hydrogen independently of one another or have 1-5 carbon atom and contain or do not contain-substituent straight chain of OH or branched-chain alkyl, R represents to have the straight chain or the branched alkylidene of 1-6 carbon atom, the ring alkylidene group with 5-7 carbon atom, the phenylene with 7-9 carbon atom or inferior aralkyl, n and m represent to be not less than 1 integer separately, and n+m is not less than 3.

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