High efficiency trap for deposition process

High efficiency trap for deposition process

  • CN 101,208,779 A
  • Filed: 05/09/2006
  • Published: 06/25/2008
  • Est. Priority Date: 06/06/2005
  • Status: Active Application
First Claim
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1. semiconductor machining system, it comprises that at least one is used for removing from the exhaust flow of vacuum machining cell the trap string group of all basically accessory substances.

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