Novel process for purifying and washing ultra-fine silicon dioxide by employing membrane separation technology

Novel process for purifying and washing ultra-fine silicon dioxide by employing membrane separation technology

  • CN 101,224,889 A
  • Filed: 02/01/2008
  • Published: 07/23/2008
  • Est. Priority Date: 02/01/2008
  • Status: Active Application
First Claim
Patent Images

1. a high-efficient washing that relates to micro-size silica powder is purified and the solid-liquid separation concentration new method, it is characterized in that micro-size silica powder after peracid treatment, forms concentration and is not higher than 30%, and pH includes SiO less than 7 2Particle and H +, SO 42-, Fe 2+, Fe 3+, Cl -The powder suspension of isoiony material, the H of 4 times of volumes of adding 2After the O dilution, under pressure less than 1MPa, by inorganic ceramic film the ionic substance in the solution is discharged outside the film, the deionized water that adds 2 times of volumes again washs, purifying, ionic impurity is all discharged gradually, and the superfine silicon dioxide particle is retained, and the pH of solution reaches 7, specific conductivity concentrates its mass percent concentration of back and also brings up to 40% less than 10 μ

  • S/cm.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×