Substrate support and lithographic process

Substrate support and lithographic process

  • CN 101,226,341 A
  • Filed: 12/10/2007
  • Published: 07/23/2008
  • Est. Priority Date: 12/08/2006
  • Status: Active Application
First Claim
Patent Images

1. substrate support that in the liquid immersion lithography process, is used for support substrates, this substrate support comprises:

  • Core;

    AndBe set at core periphery on every side;

    It is characterized in thatHeat separator (11,13,15), described heat separator are set for the heat transmission that reduces between described core and the described periphery.

View all claims
    ×
    ×

    Thank you for your feedback

    ×
    ×