Maskless lithography system with improved reliability

Maskless lithography system with improved reliability

  • CN 101,228,608 A
  • Filed: 07/25/2006
  • Published: 07/23/2008
  • Est. Priority Date: 07/25/2005
  • Status: Active Application
First Claim
Patent Images

1. one kind is used for the maskless lithography system of design transfer to the target surface comprised:

  • -at least one light pencil optical unit is used to produce a plurality of light pencils;

    -at least one measuring unit is used to measure the performance of each light pencil;

    -at least one control unit, be used to produce pattern data and pattern data is delivered to described light pencil optical unit, described control unit operability is coupled to described measuring unit, is used to determine to have the invalid light pencil of the measurement performance value outside the predetermined value scope of described performance;

    -at least one actuator, be used to cause that described light pencil optical unit and described target are movable relative to each other, wherein, described actuator and the coupling of described control unit operability, described control unit is determined described moving, effective light pencil is positioned at the position of described invalid light pencil, thereby replaces described invalid light pencil with effective light pencil.

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