Edge ring assembly with dielectric spacer ring

Edge ring assembly with dielectric spacer ring

  • CN 101,238,553 A
  • Filed: 07/24/2006
  • Published: 08/06/2008
  • Est. Priority Date: 08/08/2005
  • Status: Active Application
First Claim
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1. edge ring assembly, it is suitable for being centered around the substrate support surface in the plasma etch chamber, and described edge ring assembly comprises:

  • Edge ring, its size are suitable for being positioned at and are located under the lip-deep substrate of described indoor substrate support, and are provided at the stand-off distance between the upper surface of the lower surface of described substrate and described edge ring;

    AndDielectric spacer ring between described edge ring and described substrate support surface, the size of described dielectric spacer ring are suitable for providing stand-off distance between the upper surface of the lower surface of the lip-deep substrate of described substrate support and described dielectric spacer ring.

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