Edge ring assembly with dielectric spacer ring

Edge ring assembly with dielectric spacer ring

  • CN 101,238,553 B
  • Filed: 07/24/2006
  • Issued: 07/02/2014
  • Est. Priority Date: 08/08/2005
  • Status: Active Grant
First Claim
Patent Images

1. an edge ring assembly, it is suitable for being centered around the substrate support surface in plasma etch chamber, and described edge ring assembly comprises:

  • Coupling loop, its size is made as around the substrate support surface of supporting substrate in this plasma etching chamber;

    Edge ring, it is supported on this coupling loop and comprises that size is suitable for being positioned at the inner radial under the ledge of this substrate, and the stand-off distance between the lower surface of described substrate and the upper surface of described edge ring is provided;

    AndComprise this coupling loop axially upwards extension and be in described edge ring and described substrate support surface between dielectric spacer ring, the size of described dielectric spacer ring is suitable for providing stand-off distance between this lower surface of this substrate and the upper surface of described dielectric spacer ring, and is positioned at this ledge below of this substrate;

    Wherein the radial clearance between this edge ring and this dielectric spacer ring is less than 0.25mm, and the radial clearance between this dielectric spacer ring and this substrate support surface is less than 0.25mm.

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