Method for inhibiting oxygen and moisture degradation of a device and the resulting device

Method for inhibiting oxygen and moisture degradation of a device and the resulting device

  • CN 101,243,562 A
  • Filed: 08/09/2006
  • Published: 08/13/2008
  • Est. Priority Date: 08/18/2005
  • Status: Active Application
First Claim
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1. the method for suppression device oxygen infiltration and moisture vapour transmission said method comprising the steps of:

  • The inorganic material of deposition low liquidus temperature at least a portion of described device;

    In anaerobic and water-less environment, the inorganic material that is deposited on the described low liquidus temperature on described device at least a portion is heat-treated.

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