Ultraviolet processing equipment and method for forming stress film

Ultraviolet processing equipment and method for forming stress film

  • CN 101,246,808 B
  • Filed: 02/13/2007
  • Issued: 07/11/2012
  • Est. Priority Date: 02/13/2007
  • Status: Active Grant
First Claim
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1. apparatus for ultraviolet light treamtent;

  • Comprise cavity, be arranged in first ultraviolet source of said cavity and be used for the objective table of bearing semiconductor substrate;

    The ultraviolet light that wherein said first ultraviolet source sends shines said stage surface with vertical mode;

    It is characterized in that;

    said apparatus for ultraviolet light treamtent also comprises second ultraviolet source that is arranged in said cavity;

    The ultraviolet light that said second ultraviolet source sends shines said stage surface with the inclination mode, makes the deielectric-coating of the gate lateral wall at the said semiconductor-based end receive the identical light radiation of deielectric-coating with source region, top, drain region, and said cavity has diapire, roof and sidewall;

    It is inboard that said first ultraviolet source is positioned at said roof;

    Said objective table is positioned at said inside bottom wall, and said second ultraviolet source is positioned at said inside sidewalls, and said second ultraviolet source is adjustable to the distance of said stage surface.

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