Method for manufacturing mask

Method for manufacturing mask

  • CN 101,281,360 A
  • Filed: 08/20/2007
  • Published: 10/08/2008
  • Est. Priority Date: 04/02/2007
  • Status: Active Application
First Claim
Patent Images

1. the manufacture method of a mask comprises the following steps:

  • One substrate is provided, and this substrate has first damping layer that is positioned at this substrate top and is positioned at first image layer on this first damping layer;

    Use first emittance that this first image layer is carried out first step of exposure writing under the pattern;

    This first damping layer is carried out first etching step;

    This substrate is carried out second etching step;

    On this first damping layer and this substrate, form second image layer;

    Use a light ray energy and a mask that this second image layer is carried out second step of exposure;

    AndAfter this second step of exposure, this first damping layer is carried out the 3rd etching step.

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