Grinding head for chemical mechanical polishing and method for producing the same

Grinding head for chemical mechanical polishing and method for producing the same

  • CN 101,327,574 A
  • Filed: 06/18/2007
  • Published: 12/24/2008
  • Est. Priority Date: 06/18/2007
  • Status: Active Application
First Claim
Patent Images

1. the grinding head of a chemically mechanical polishing includes:

  • The film support seat, this film support seat is roughly video disc shape, it has first surface, second surface and the ring-side wall between this first surface and this second surface, and this film support seat has at least one passage and at least one water conservancy diversion opening in addition, wherein this film support seat has the center of circle and radius R, and this film support seat include central area be positioned at this distance of center circle from (2/3) R with border circular areas, and the surrounding zone is positioned at the annular region of (2/3) R to R apart from this center of circle, and this passage is to be positioned at this central area, and this water conservancy diversion opening is to be positioned within this surrounding zone;

    AndFilm is supported by this film support seat.

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