Chemically amplified negative resist composition and patterning process

Chemically amplified negative resist composition and patterning process

  • CN 101,387,831 A
  • Filed: 03/28/2008
  • Published: 03/18/2009
  • Est. Priority Date: 03/29/2007
  • Status: Active Application
First Claim
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1. chemical amplification negative resist composition that contains polymkeric substance, described polymkeric substance comprise the have general formula repetitive of (1) and (2):

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