Cluster tool for epitaxial film formation

Cluster tool for epitaxial film formation

  • CN 101,415,865 A
  • Filed: 04/06/2007
  • Published: 04/22/2009
  • Est. Priority Date: 04/07/2006
  • Status: Active Application
First Claim
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1. method that forms epitaxial film, it comprises at least:

  • Before epitaxial film forms, utilize the one first gas substrate of clean bits in one first treatment chamber in advance;

    Under vacuum,, this substrate is sent to one second treatment chamber from this first treatment chamber by a delivery chamber;

    AndNeed not utilize this first gas can form on an epitaxial film this substrate in this second treatment chamber.

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