Exposure apparatus and device producing method

Exposure apparatus and device producing method

  • CN 101,477,312 B
  • Filed: 09/03/2004
  • Issued: 04/08/2015
  • Est. Priority Date: 09/03/2003
  • Status: Active Grant
First Claim
Patent Images

1. an exposure sources, comprise:

  • the projection optical system on the substrate that the image projection of mask to microscope carrier is supported and be used for being formed the atmosphere formation mechanism of particular fluid atmosphere between described projection optical system and described microscope carrier or described substrate, the feature of this exposure sources isDescribed atmosphere formation mechanism comprises the atmosphere forming member forming described particular fluid atmosphere,The top of described atmosphere forming member is made up of deformable component, and described atmosphere forming member is supported on support platform by described deformable component,Described atmosphere forming member has;

    Particular fluid supply port, is linked to the end of particular fluid supply pipe;

    WithParticular fluid recovery port, around the light path of the light of exposure, is configured in the outside of described particular fluid supply port, and is linked to the end of particular fluid vent pipe,Described deformable component cushions and supporting role for described atmosphere forming member provides, even if when described microscope carrier or described substrate contact obliquely with described atmosphere forming portion, the power that described in described microscope carrier or described substrate contact, atmosphere forming member produces also is buffered.

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