A nano imprint technique with increased flexibility with respect to alignment and feature shaping

A nano imprint technique with increased flexibility with respect to alignment and feature shaping

  • CN 101,479,842 A
  • Filed: 04/05/2007
  • Published: 07/08/2009
  • Est. Priority Date: 06/30/2006
  • Status: Active Grant
First Claim
Patent Images

1. , a kind of method comprises the following steps:

  • Vias and groove jointly are impressed in the material layer that is molded that forms on substrate, and this vias and this groove are corresponding to the feature of the metallization structure of micro-structural device;

    AndForm through hole and lead according to this vias and this groove.

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